A spin-on photosensitive polymeric etch protection mask for anisotropic wet etching of siliconDALVI-MALHOTRA, J; ZHONG, X. F; PLANJE, C et al.Journal of micromechanics and microengineering (Print). 2008, Vol 18, Num 2, issn 0960-1317, 025029.1-025029.8Article

Photosensitive Etch Protection Coating for Silicon Wet-Etch ApplicationsDALVI-MALHOTRA, J; ZHONG, X. F; PLANJE, C et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 68840J.1-68840J.8, issn 0277-786X, isbn 978-0-8194-7059-1Conference Paper

Use of silane-based primer on silicon wafers to enhance adhesion of edge-protective coatings during wet etching : Application of the TALON Wrap<^TM> processDALVI-MALHOTRA, J; BRAND, G. J; ZHONG, X.-F et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 64620B.1-64620B.7, issn 0277-786X, isbn 978-0-8194-6575-7, 1VolConference Paper